CVD Thin-Film Encapsulation
A variety of equipment is available at i3-opera, such as a high-performance vapor deposition system capable of combinatorial TEG fabrication combined with PE-CVD deposition continuously in vacuum.
Durability of CVD-encapsulated OLEDs can be examined under high temperature and high humidity conditions.
Property of SiN Thin-Film
- Deposition temp.:60℃
- Refractive index:1.89
- Compressive stress: ~ -100 Mpa
- WVTR:~ 2.0×10^(-5) g/m²/day (1,000 nm-thick)
※ 1)MA method using the gas/water vapor transmission rate analyzer by MORESCO Corp.
※ 2)Obtained from cooperation by Innovation Center for Organic Electronics (INOEL) at Yamagata University.
Evaluation of OLEDs encapsulated with SiN Thin-Film